Al2O3- Sapphire Wafer, C-plane (0001), 10x10x0.5mm, 2 SP - ALC101005S2

Al2O3- Sapphire Wafer, C-plane (0001), 10x10x0.5mm, 2 SP - ALC101005S2Features: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 10 x 10 x 0. 5 mm thick Orientation: <0001> + 0. 5o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A 2 sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with

Size    Click to enlarge the picture below for detailed size

combination of grinding jar and milling ball

The syringe holder height can be adjusted and rotated freely along the support rod

OD: 104mm)

Manual & Video

Vacuum 0~ -90 kPa

or substrate with regular  ( 5x5

45mm) with a tolerance +/- 0

Remained solvent

Resistivity:   N/A

Features: Sapphire ( single crystal of Al2O3 ) is being used extensively as a substrate for III-V nitrides and for many other epitaxial films

MTI-HH-3450P